Measurements
Through the scientific departments, the Institute possesses a large group of high-precision measuring devices in the field of electronics, communications, and electrical power, in addition to central laboratories (such as the Specific Absorption Rate Measurement Laboratory - Electronic Waste Treatment - Millimeter Wave Circuit Measurement - Materials Analysis XRD Laboratory) and specialized laboratories (Nano Technology Laboratory). - Cloud Computing Laboratory).
See What We Offer..
RF/DC/reactive Magnetron sputtering system with heated and rotated sample holder with thickness monitor
Different material types (Metals/semiconductors /dielectric) Thin film deposition on different substrates Targets (Au, Ag, Cu, Ti, Ni, Cu, Al, C, Si, ITO, ZnO, Al-ZnO, etc.
High vacuum Thermal evaporation with thickness monitor and sample rotation
Thermal evaporation of materials using Mo/W boats.
Bulk metallic films of high conductivity and shiny style on Silicon, glass, plastic and other substrates.
High Power/Qswitched nanosecond UV 10W355nm NIR 50W1068nm High speed laser engraver system.
Selective High Speed laser system for patterning and dryer lithography processing with 25um accuracy using CAD designs on different materials.
5V/5A 8- channels Battery analyzer
Measure Coin/cylinder cell performance CV/CC till 5A/5V.
Potentiostat/ galvanostat VSP -300 Bio -Logic
used to measure and characterize the electrochemical analysis of different applications such as sensors, supercapacitors and batteries.
- 1A/10V EIS card
- 4V/14 Booster
- 1A/48V Booster
- Ultra-low current option.
- 3-electrodes 150 ml standred cell (Ag/AgCl - calomel and Pt wire electrodes)
UV/VIS/NIR 200 -950 nm Spectrometer
It is a device for measuring wavelengths of light over a wide range of the electromagnetic spectrum.
It is widely used for spectroscopic analysis of sample materials.
The incident light from the light source can be transmitted, absorbed or reflected through the sample.
Plasma Enhanced Chemical Vapor Deposition (PECVD)
PECVD is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate.
Chemical reactions are involved in the process, which occur after creation of plasma of the reacting gases.
Monowave300 (Microwave Reactor)
The use of microwave irradiation is an efficient tool for nanocrystal synthesis.
can be used to increase the temperature of the sample up to 300oC and the pressure up to 30 Par according to the required specifications and time of operation.
High Energy ball milling
The Emax is an entirely new type of ball mill for high energy milling.
The unique combination of high friction and impact results in extremely fine particles within the shortest amount of time.
Diamond saw
Diamond blade micrometer precise sharp cutting edges of different substrates
Screen system
Screen system with different mesh screens 5, 30 and 50 Microns.
Can be used to filter fine materials based on the powder size
3 Grinding Ball Milling
In this ball milling,the powder mixture is subjected to high energy collision from solid balls.
Exfoliation of powder samples as well as large particles grinding